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Product Identifiers
PublisherSpie
ISBN-100819458295
ISBN-139780819458292
eBay Product ID (ePID)46912506
Product Key Features
Number of Pages276 Pages
Publication NameOptical Imaging in Projection Microlithography
LanguageEnglish
Publication Year2005
SubjectElectronics / Circuits / Integrated, Industrial Technology, Imaging Systems
TypeTextbook
Subject AreaTechnology & Engineering
AuthorAlfred K. Wong
SeriesTutorial Texts
FormatTrade Paperback
Dimensions
Item Height0.7 in
Item Weight20.6 Oz
Item Length10 in
Item Width7.1 in
Additional Product Features
Intended AudienceScholarly & Professional
LCCN2005-042537
Series Volume NumberTT66
IllustratedYes
SynopsisAn integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective., Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
LC Classification NumberTK7836.W66 2005
